フラーレン誘導(dǎo)體及びその製造方法
基本信息
| 申請(qǐng)?zhí)?/td> | JP20120216891 | 申請(qǐng)日 | - |
| 公開（公告）號(hào) | JP6065502(B2) | 公開（公告）日 | 2017-01-25 |
| 申請(qǐng)公布號(hào) | JP6065502(B2) | 申請(qǐng)公布日 | 2017-01-25 |
| 分類號(hào) | C07C69/63;C07C67/04;C07C67/08;C07C69/736;C07C69/96;C07D309/12 | 分類 | 有機(jī)化學(xué)〔2〕; |
| 發(fā)明人 | 日置優(yōu)太;川上公徳 | 申請(qǐng)（專利權(quán)）人 | 三菱商事株式會(huì)社 |
| 代理機(jī)構(gòu) | - | 代理人 | - |
| 地址 | - | ||
| 法律狀態(tài) | - | ||
摘要
| 摘要 | PROBLEM TO BE SOLVED: To provide a fullerene derivative having both of an acid decomposable substituent and a leaving substituent having reactivity with a hydroxyl group or the like, which is useful for an electronic material, a photoresist material, a resin additive, a physiological active substance or the like.SOLUTION: The fullerene derivative includes a substituent (D) having an acid dissociable partial structure and a leaving substituent, or includes a leaving substituent (L) and a substituent (A) having an acid dissociable partial structure. (A fullerene skeleton of the fullerene derivative may include any substituent other than the substituent (D), or the substituent (A) and the leaving substituent (L)). The acid dissociable partial structure is preferably an acetal type partial structure and/or an ester type partial structure. The leaving substituent (L) is a halogen atom, -O-SO-R, or -O-R(where Rrepresents an alkyl or haloalkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 20 carbon atoms). |
